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                通知公告

                JoMM“Special Issue on CAD Technologies”特刊发表

                稿件来源: 发布时间:2021-01-21

                  近期,《Journal of Microelectronic Manufacturing》(JoMMISSN2578-3769)邀请李序武博士(Dr. Shiuh-Wuu Leeex-EVP and ex-CTO of SMIC)为本期专栏的客座编辑,出版了主题为“CAD Technologies”的特刊专栏。特刊文章的作者来自IntelUC BerkeleyTU BraunschweigU. of GlasgowSynopsysICRDAnchor SemiconductorIMECAS等国际著名集成电路企业、大学和研究机构。 

                  JoMM旨在发表集成电路制造领域中从基础研究阶段到工业大规模量产阶段的研究成果,目前已被CrossrefDOAJCAS、知网、维普等数据库收录。JoMM的发表内容包括但不限于DesignProcessMetrology & Yield ControlPackagingMaterialsEquipment 等方面。  

                       本期特刊文章如下: 

                      Guest Editorial: Special Issue on CAD Technologies 

                      Shiuh-Wuu Lee 

                      2020 JoMM Volume 3, Issue 4: 20030401 


                 

                      BSIM-CMG compact model for IC CAD: from FinFET to Gate-All-Around FET Technology 

                  Avirup Dasgupta, Chenming Hu. 

                  2020 JoMM Volume 3, Issue 4: 20030402 

                   On the History of the Numerical Methods Solving the Drift Diffusion Model 

                  Bernd Meinerzhagen. 

                  2020 JoMM Volume 3, Issue 4: 20030403 

                  

                  Nano-Electronic Simulation Software (NESS): A Novel Open-Source TCAD Simulation Environment 

                  Cristina Medina-Bailon, Tapas Dutta, Fikru Adamu-Lema, Ali Rezaei, Daniel Nagy, Vihar P. Georgiev, Asen Asenov. 

                  2020 JoMM Volume 3, Issue 4: 20030404 
                 

                 

                  First-principles Simulations of Tunneling FETs Based on van der Waals MoTe2/SnS2 Heterojunctions with Gate-to-drain Overlap Design 

                  Kun Luo, Kui Gong, Jiangchai Chen, Shengli Zhang, Yongliang Li, Huaxiang Yin, Zhenhua Wu. 

                  2020 JoMM Volume 3, Issue 4: 20030405 

                 

                 

                  Material Modeling in Semiconductor Process Applications 

                  Boris A. VoinovPatrick H. KeysStephen M. CeaAnanth P. KaushikMark A. Stettler. 

                  2020 JoMM Volume 3, Issue 4: 20030406 

                 

                 

                  Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN 

                  Xuelong ShiYan YanTao ZhouXueru YuChen LiShoumian ChenYuhang Zhao. 

                  2020 JoMM Volume 3, Issue 4: 20030407 

                   Machine Learning based Optical Proximity Correction Techniques 

                  Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu, Yayi Wei. 

                  2020 JoMM Volume 3, Issue 4: 20030408  

                 

                  Enabling Variability-Aware Design-Technology Co-Optimization for Advanced Memory Technologies 

                  Salvatore M. AmorosoPlamen AsenovJaehyun LeeNara KimKo-Hsin LeeYaohua TanYong-Seog OhLee SmithXi-Wei LinVictor Moroz. 

                  2020 JoMM Volume 3, Issue 4: 20030409 
                 

                 

                  Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development 

                  Chenmin HuKhurram ZafarAbhishek VikramGeoffrey Ying. 

                  2020 JoMM Volume 3, Issue 4: 20030410 


                   作为开放阅览电子学术期刊,JoMM致力于实现快速发表,稿件录用后即时上线,可阅览、下载、引用。目前JoMM正在进行2021年征稿,并免版面费,同时也在征集Special Issue的专题(topic is open),以及欢迎新编委、同行评审专家加入JoMM,详情请查看官网www.jommpublish.org/. 

                       欢迎投稿! 

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